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Contact Us For Cardiff Authors User Area Login How to Add Research How to Add a Research Thesis Copyright FAQ Insulation strength of CF

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gas or gas mixture for substituting SF6. Trifluoroiodomethane (CF3I) has been introduced stable over 100 close/open operations and the

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SF6 and CF4 gases, leading to high whereas PVC was stable even 210 days after -generated plasmas produced in Ar/SF6 mixtures

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The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

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Decomposed Das Density of CF3I as a Substitute for SF6 Gas

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Eight Single Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6

Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6 at Two Film gas mixture density heat capacity forced convective heat transfer heat transfer

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The film's deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

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spark decomposition of SF6 and 50% SF6 + 50% CF4 mixtures

on the spark decomposition of SF6 and 50% SF6 + 50% CF4 mixturesThe gaseous by-products , , , , , , and were assayed by gas

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The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

field breakdown characteristics of SF6/CF4 mixtures at

The breakdown and the corona inception voltages experiments of SF<sub>6</sub>/CF<sub>4</sub> mixtures in non-uniform

of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~,

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TRAFAG SF6 CF4 SF6_

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2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su

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characteristics of SF6-N2 and SF6-CF4 gas mixtures |

2017101- on the insulation characteristics of SF6-N2 and SF6-CF4 gas mixturesThe underlying high-order scheme is supposed to be unconditionally s

of Gases in Liquids. 20. Solubility of He, Ne, Ar, Kr, N2,

The Ostwald coefficients L2,1 of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2, 6 ≤ l

of Gases in Liquids 9. Solubility of He, Ne, Ar, Kr, N2,

The Solubility of Gases in Liquids 9. Solubility of He, Ne, Ar, Kr, N2, O2, CO, CO2, CH4, CF4, and SF6 in some Dimethylcyclohexanes at 298

(CFN)

Last modification on : Thursday, February 7, 2019 - 4:56:13 PMReactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2