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The Ostwald coefficients L2,1 of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2, 6 ≤ l

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2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su

Negative ion motion in the mixtures of SF6 with CF4 and CH4-Ar.

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The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

Properties of Binary Gas Mixtures of CH4, CF4, SF6, and C(

equilibrium and transport properties of low-density gas mixtures. SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

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Reactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2 etch products. Applied Physics Letters, American Institute of Physics, 2001,

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1- Interruption Capability and Decomposed Das Density of CF3I as a Substitute for SF6 Gas.2- Electrical Breakdown of CF3I and CF3I-N2 Gas Mixture

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The film's deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

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of gases in liquids. 21. Solubility of He, Ne, Ar, Kr, N2,

Solubility of gases in liquids. 21. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6in 2,2,4-trimethylpentane atT = 298.15 K on

of Gases in Liquids 9. Solubility of He, Ne, Ar, Kr, N2,

The Solubility of Gases in Liquids 9. Solubility of He, Ne, Ar, Kr, N2, O2, CO, CO2, CH4, CF4, and SF6 in some Dimethylcyclohexanes at 298